Adhesive compound and method for forming photoresist pattern...

Details Adhesive compound and method for forming photoresist pattern... Adhesive compound and method for forming photoresist pattern...

2006-04-11

2006-04-11

Barts, Samuel (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

C556S410000, C430S141000, C430S270100, C430S311000, C430S313000

Reexamination Certificate

active

07026497

ABSTRACT:
An adhesive compound for use during the formation of a photoresist film represented by the following chemical formula,wherein R represents a photoacid generator is disclosed.

REFERENCES:
patent: 7-335603 (1995-12-01), None
patent: 2001-181585 (2001-07-01), None
patent: 2002-050778 (2002-02-01), None

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