Adhesion of silicon oxide to diamond

Details Adhesion of silicon oxide to diamond Adhesion of silicon oxide to diamond

1993-10-22

2000-07-11

Turner, Archene

Stock material or miscellaneous articles

Self-sustaining carbon mass or layer with impregnant or...

0257 77, 428701, 428702, H01L 2966

Patent

active

060870052

ABSTRACT:
An article includes a diamond substrate which is securely adhered to a rot layer of silica layer that cannot be scratched by a tungsten probe or delaminated from the diamond substrate by pulling on a gold wire secured to the silica layer. This aricle can be made by electrochemically cleaning the diamond substrate to remove non-diamond carbon adhering thereto, depositing a fragile layer of silica layer which weakly bonds to the cleaned diamond, and annealing the fragile silica layer to convert it into a strongly bonded and robust silicon dioxide layer. The article is particularly useful in electronics, and has a low leakage current and low responsiveness to visible light.

REFERENCES:
patent: 5006203 (1991-04-01), Purdes
patent: 5146481 (1992-09-01), Garg
patent: 5173761 (1992-12-01), Dreifus et al.
patent: 5219769 (1993-06-01), Yonehara et al.
patent: 5285084 (1994-02-01), von Windheim t al.

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