Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1985-11-01
1988-08-16
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430275, 430258, 430271, 51310, 51312, G03C 1112, G03F 726, B24C 104, B44C 122
Patent
active
047644494
ABSTRACT:
A sandblast photoresist laminate article of manufacture comprising an adhesive layer, a membrane support layer, and a resist layer can be used in etching the surface of articles with a pattern which can be revealed by the resist layer. The resist laminate is usable in a variety of modes of etching such as exposing the resist with a pattern, developing the pattern, applying the developed resist to the object, and etching the pattern into the object. Further, the resist can be used by applying the unexposed sheet-like resist to an object, exposing the resist with a pattern, developing the pattern and etching the pattern into the object. Lastly, the resist laminate can be used by exposing the resist with a pattern, applying the exposed resist to an object, developing the pattern, and etching the pattern into the object. The resist compositions are typically water developable after exposure with actinic radiation.
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Ichimura, Kunihiro, "Preparation of Water-Soluble Photoresist Derived from Poly(vinyl Alcohol), J. Poly. Sci., vol. 20, 1982.
Ichimura, Kunihiro et al., "Preparation & Characteristics of Photocrosslinkable Poly(vinyl Alcohol)", J. Poly. Sci., vol. 20, 1982.
Hamilton Cynthia
Michl Paul R.
The Chromaline Corporation
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