Additive process for manufacturing a mask for use in X-ray photo

Details Additive process for manufacturing a mask for use in X-ray photo Additive process for manufacturing a mask for use in X-ray photo

1985-08-02

1987-09-29

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430296, 430966, 378 35, G03F 900

Patent

active

046968784

ABSTRACT:
An additive process for manufacturing a mask (113) used in x-ray photolithography includes the step of coating a boron nitride layer (102) with a layer of indium tin oxide (104) and a second layer of boron nitride (106). The second boron nitride layer is patterend and used as a stencil during a plating process while the indium tin oxide layer is used as a plating base. Because boron nitride and thin indium tin oxide are both x-ray transparent, neither the stencil nor the plating base need be removed during the manufacturing process.

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patent: 4549939 (1985-10-01), Kenworthy et al.
Maydan et al., "Boron Nitride Mask Structure for X-Ray Lithography", J. Vac. Sci Technol., 16(6), Nov./Dec. 1979, pp. 1959-1961.
Shimkunas, A. R., "Advances in X-Ray Mask Technology", Solid State Technology, Sep. 1984, pp. 192-199.
Georgiou et al., "DC Electroplating of Sub-Micron Gold Patterns on X-Ray Masks", SPIE, vol. 471 (1984), pp. 96-102.
Buckley, W. D. et al., "X-Ray Lithography Mask Technology", Solid State Science and Technology, May, 1981, vol. 128, No. 5, pp. 1116-1120.

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