Additive for inhibiting photolytic degradation reactions in...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Processes of preparing a desired or intentional composition...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C524S100000, C524S715000, C524S720000, C252S401000, C252S402000, C428S411100, C428S532000

Reexamination Certificate

active

07368489

ABSTRACT:
The invention relates to a UV additive for aminoplast resins, to a method for producing a UV additive as well as to uses thereof. Said UV additive contains soluble sterically-hindered nitroxyl compounds in an aqueous aminoplast precondensate. A UV additive for aminoplast resins with several application forms is thus obtained.

REFERENCES:
patent: 4937349 (1990-06-01), Burdeska et al.
patent: 5436345 (1995-07-01), Lewis et al.
patent: 5461151 (1995-10-01), Waterman
patent: 5496875 (1996-03-01), Borzatta et al.
patent: 5629426 (1997-05-01), Pastor et al.
patent: 6080864 (2000-06-01), Cunkle et al.
patent: 2006/0183821 (2006-08-01), Kaspers et al.
patent: 0 112 120 (1984-06-01), None
patent: 0 483 488 (1992-05-01), None
patent: 0 581 737 (1994-02-01), None
patent: 0 659 877 (1995-06-01), None
patent: 0 704 560 (1996-04-01), None
patent: 2000-327658 (2000-11-01), None
patent: WO 9932534 (1999-07-01), None
patent: WO 99/57189 (1999-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Additive for inhibiting photolytic degradation reactions in... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Additive for inhibiting photolytic degradation reactions in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Additive for inhibiting photolytic degradation reactions in... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2753120

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.