Addition of power at selected harmonics of plasma processor...

Details Addition of power at selected harmonics of plasma processor... Addition of power at selected harmonics of plasma processor...

2005-07-12

2005-07-12

Deb, Anjan K. (Department: 2858)

Electricity: measuring and testing

Using ionization effects

For analysis of gas, vapor, or particles of matter

C324S622000, C324S623000, C427S569000, C438S009000

Reexamination Certificate

active

06917204

ABSTRACT:
A method for controlling the non-uniformities of plasma-processed semiconductor wafers by supplying the plasma with two electrical signals: a primary electrical signal that is used to excite the plasma, and a supplemental electrical signal. The supplemental signal may be composed of a plurality of electrical signals, each with a frequency harmonic to that of the primary signal. The phase of the supplemental signal is controlled with respect to the phase of the primary signal. By adjusting the parameters of the supplemental signal with respect to the primary signal, the user can control the parameters of the resultant plasma and, therefore, control the non-uniformities induced in the semiconductor wafer.

REFERENCES:
patent: 5325019 (1994-06-01), Miller et al.
patent: 5698062 (1997-12-01), Sakamoto et al.
patent: 5705931 (1998-01-01), Klick
patent: 5808415 (1998-09-01), Hopkins
patent: 5844369 (1998-12-01), Yoshizako et al.
patent: 5849372 (1998-12-01), Annaratone et al.
patent: 6089181 (2000-07-01), Suemasa et al.

Affiliated with

Also associated with

Rating

Addition of power at selected harmonics of plasma processor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Addition of power at selected harmonics of plasma processor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Addition of power at selected harmonics of plasma processor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3375234