Addenda for an aqueous photographic stabilizing solution

Details Addenda for an aqueous photographic stabilizing solution Addenda for an aqueous photographic stabilizing solution

1996-03-21

1996-11-26

Le, Hao Van

Radiation imagery chemistry: process, composition, or product th

Post imaging processing

Stabilizing

430372, 430428, 430463, G03C 1106

Patent

active

055784321

ABSTRACT:
A stabilizing bath that provides image stability and uniform drainage of excess fluid to prevent drying spots and that reduces or eliminates the formation of residue on the base side of color negative films is comprised of hexamethylenetetramine, a nonionic polyethoxylated surfactant, and an anionic sulfate or sulfonate surfactant. The stabilizing bath is used as the final processing bath prior to drying. The nonionic surfactant provides uniform drainage of excess fluid and the anionic sulfate or sulfonate surfactant functions to reduce or eliminate the formation of residue on the base side of color negative films.

REFERENCES:
patent: 2618558 (1952-11-01), Vittum et al.
patent: 3833376 (1974-09-01), Newman et al.
patent: 4332886 (1982-06-01), Aoki et al.
patent: 4696891 (1987-09-01), Guzzi
patent: 4745047 (1988-05-01), Asami et al.
patent: 4778743 (1988-10-01), Ishikawa et al.
patent: 4786583 (1988-11-01), Schwartz
patent: 4849333 (1989-07-01), Fujita
patent: 4923782 (1990-05-01), Schwartz
patent: 5087554 (1992-02-01), Chari et al.
patent: 5104775 (1992-04-01), Abe et al.
patent: 5360700 (1994-11-01), Kawamura et al.

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