Adaptive phase mask for producing a phase shift in incident...

Optical: systems and elements – Glare or unwanted light reduction – With mirror

Reexamination Certificate

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C359S849000, C359S853000

Reexamination Certificate

active

07434947

ABSTRACT:
Systems and methods for shifting the phase of incident light to induce a continuous phase variation in an azimuthal direction. A phase mask apparatus includes a conical mirror assembly and a flexible annular reflector that substantially surrounds at least a portion of the conical mirror assembly. The flexible annular reflector is configured to receive reflected light from the conical mirror assembly. A plurality of driver assemblies are operative to deform the flexible annular reflector as to produce the desired phase response in light reflected from the annular reflector.

REFERENCES:
patent: 3523298 (1970-08-01), Hagen
patent: 4923293 (1990-05-01), Nelles et al.
patent: 5249080 (1993-09-01), Watson et al.
patent: 5291333 (1994-03-01), Mills et al.
patent: 5450352 (1995-09-01), Ftaclas et al.
patent: 5854713 (1998-12-01), Kuroda et al.
patent: 5898529 (1999-04-01), Meyer et al.
patent: 2004/0156087 (2004-08-01), Oppenheimer et al.
patent: 2007/0286461 (2007-12-01), Deforest
Mawet, et al.: “Annular Groove Phase Mask Coronagraph”; The Astrophysical Journal, Nov. 10, 2005/vol. 633, pp. 1191-1200.
Foo, et al.: “Optical Vortex Coronagraph”; Optics Letters, vol. 30, No. 24, Dec. 15, 2005, pp. 3308-3310.

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