Image analysis – Applications – Manufacturing or product inspection
Patent
1997-01-03
1999-11-02
Tadayon, Bijan
Image analysis
Applications
Manufacturing or product inspection
382224, G06K 900
Patent
active
059785012
ABSTRACT:
A method and system for detecting defects in the design of a photolithographic mask or a printed wafer. It derives an adaptive inspection algorithm that allows for a tighter inspection of a mask to a data set which has repeatable differences. The inspection should allow flexibility to remove un-important differences while maintaining a tight inspection capability.
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Badger Karen Marie Dusablon
Grenon Brian Joseph
O'Grady David Shawn
Smolinski Jacek Grzegorz
International Business Machines - Corporation
Leas James A.
Tadayon Bijan
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