Adaptive inspection method and system

Image analysis – Applications – Manufacturing or product inspection

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382224, G06K 900

Patent

active

059785012

ABSTRACT:
A method and system for detecting defects in the design of a photolithographic mask or a printed wafer. It derives an adaptive inspection algorithm that allows for a tighter inspection of a mask to a data set which has repeatable differences. The inspection should allow flexibility to remove un-important differences while maintaining a tight inspection capability.

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