Adaptable processing element for a processing system and a...

Details Adaptable processing element for a processing system and a... Adaptable processing element for a processing system and a...

2007-12-11

2007-12-11

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298070, C118S715000, C118S720000, C156S345330, C156S345430

Reexamination Certificate

active

10454747

ABSTRACT:
The present invention presents an adaptable processing element for use in a processing system having multiple configurations. The processing element comprises a primary component and at least one detachable component, wherein the at least one detachable component can be retained for one configuration and removed for another configuration. For example, the detachable component may include a punch-out or knock-out located on a right-hand side and a left-hand side of a processing element in order to permit access of a gas supply line to a processing chamber for either a right-hand orientation or a left-hand orientation, respectively. Additionally, for example, the detachable component, whether retained or removed, can permit flexible use with different size processing chambers.

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patent: 08-273221 (1996-10-01), None

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