Adamantane derivative, process for producing the same, and...

Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acid esters

Reexamination Certificate

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C560S222000

Reexamination Certificate

active

07456311

ABSTRACT:
The invention provides a novel adamantane derivative useful as a monomer for producing functional resins such as photosensitive resins particularly for use in lithography, and a method for producing the derivative. The adamantane derivative has a structure represented by formula (I-a) and the method for producing the adamantane derivative employs a corresponding adamantane derivative serving as a starting material. In formula (I), R1represents H, CH3, or CF3; R2arepresents a C1 to C30 alkyl group or a hydrocarbon group containing a C3 to C30 cycloalkyl group or a C6 to C30 aryl group, the alkyl group or the hydrocarbon group having a hetero atom; each of X1and X2represents O or S; Y represents a C1 to C10 alkyl group, a halogen atom, OH, or SH, or two Ys are linked to form ═O or ═S; k represents an integer of 0 to 14; and each of m and n is an integer of 0 to 2.

REFERENCES:
patent: 2002/0058197 (2002-05-01), Nozaki et al.
patent: 2007/0129532 (2007-06-01), Hatakeyama et al.
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patent: 2005-220066 (2005-08-01), None
<http://www.organic-chemistry.org
amedreactions
ucleophilic-substitution-sn1-sn2.shtm>[visited Dec. 3, 2007].
U.S. Appl. No. 11/575,555, filed Mar. 19, 2007, Hatakeyama, et al.
U.S. Appl. No. 10/588,080, filed Jan. 10, 2007, Hatakeyama, et al.

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