Active reactant vapor pulse monitoring in a chemical reactor

Details Active reactant vapor pulse monitoring in a chemical reactor Active reactant vapor pulse monitoring in a chemical reactor

2008-05-20

2008-05-20

Soderquist, Arlen (Department: 1797)

Chemistry: analytical and immunological testing

Rate of reaction determination

C118S715000, C118S7230AN, C118S7230MP, C422S062000, C427S096800, C427S248100, C427S250000, C427S255230, C427S255280, C427S569000, C427S585000

Reexamination Certificate

active

07374941

ABSTRACT:
A method and apparatus for determining changes in a supply system, designed to supply repeated pulses of a vapor phase reactant to a reaction chamber is disclosed. One embodiment involves providing the reactant source, and a gas conduit to connect the reactant source to the reaction chamber, a valve positioned in communication with the reactant source such that switching of the valve induces vapor phase reactant pulses from the reactant source to the reaction chamber and a sensor positioned in communication with the reactant source and configured to provide a signal indicative of a characteristic parameter of the reactant pulse as a function of time. A curve is derived from the signal and the shape of the curve is monitored to determine changes in the curve shape over time during subsequent pulses.

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