Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Patent
1996-12-20
1999-05-18
Chaudhuri, Olik
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
438 73, 438 78, 257292, H01L31/101;31/105
Patent
active
059044934
ABSTRACT:
The optimization of two technologies (CMOS and CCD) wherein a pinned photodiode is integrated into the image sensing element of an active pixel sensor. Pinned photodiodes are fabricated with CCD process steps into the active pixel architecture. Charge integrated within the active pixel pinned photodiode is transferred into the charge sensing node by a transfer gate. The floating diffusion is coupled CMOS circuitry that can provide the addressing capabilities of individual pixels. Alternatively, a buried channel photocapacitor can be used in place of the pinned photodiode.
REFERENCES:
patent: 5262871 (1993-11-01), Wilder et al.
patent: 5369039 (1994-11-01), Hynecek
Paul P.Lee, et al., "An Active Pixel Sensor Fabricated Using CMOS/CCD Process Technology" Published at IEEE Workshop on Charge Couple Device and Advanced Image Sensors, in Dana Point California, on Apr. 20, 1995 as a handout.
Guidash Robert M.
Lee Paul P.
Lee Teh-Hsuang
Stevens Eric G.
Chaudhuri Olik
Coleman William David
Eastman Kodak Company
Leimbach James D.
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