Active matrix substrate plate and manufacturing method therefor

Details Active matrix substrate plate and manufacturing method therefor Active matrix substrate plate and manufacturing method therefor

2005-05-10

2005-05-10

Gurley, Lynne A. (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S029000, C438S149000

Reexamination Certificate

active

06890783

ABSTRACT:
An active matrix substrate plate having superior properties is manufactured at high yield using four photolithographic fabrication steps. In step 1, the scanning line and the gate electrode extending from the scanning line are formed in the glass plate. In step 2, the gate insulation layer and the semiconductor layer comprised by amorphous silicon layer and n+amorphous silicon layer is laminated to provide the semiconductor layer for the TFT section. In step 3, the transparent conductive layer and the metallic layer are laminated, and the signal line, the drain electrode extending from the signal line, the pixel electrode and the source electrode extending from the pixel electrode are formed, and the n+amorphous silicon layer of the channel gap is removed by etching. In step 4, the protective insulation layer is formed, and the protective insulation layer and the metal layer above the pixel electrode are removed by etching.

REFERENCES:
patent: 4778560 (1988-10-01), Takeda et al.
patent: 5032531 (1991-07-01), Tsutsui et al.
patent: 5060036 (1991-10-01), Choi
patent: 5459090 (1995-10-01), Yamazaki et al.
patent: 5462887 (1995-10-01), Gluck
patent: 5474945 (1995-12-01), Yamazaki et al.
patent: 5508289 (1996-04-01), Michejda et al.
patent: 5610738 (1997-03-01), Sasano et al.
patent: 5656526 (1997-08-01), Inada et al.
patent: 5774100 (1998-06-01), Aoki et al.
patent: 5830785 (1998-11-01), Sanson et al.
patent: 5867233 (1999-02-01), Tanaka
patent: 5870075 (1999-02-01), Yamazaki et al.
patent: 5930607 (1999-07-01), Satou
patent: 6072559 (2000-06-01), Kanemori et al.
patent: 6162654 (2000-12-01), Kawabe
patent: 6218219 (2001-04-01), Yamazaki et al.
patent: 6511896 (2003-01-01), Basceri et al.
patent: 6573564 (2003-06-01), Yamazaki et al.
patent: 6599786 (2003-07-01), Ahn et al.
patent: 6600546 (2003-07-01), Ahn et al.
patent: 20010019859 (2001-09-01), Yamazaki et al.
patent: 0 747 182 (1996-12-01), None
patent: 0 837 447 (1998-04-01), None
patent: 62-35669 (1987-02-01), None
patent: 63-15472 (1988-01-01), None
patent: 05-113580 (1993-05-01), None
patent: 05-203988 (1993-08-01), None
patent: 6-160905 (1994-06-01), None
patent: 7-175084 (1995-04-01), None
patent: 7-147410 (1995-06-01), None
patent: 07-199227 (1995-08-01), None
patent: 8-15733 (1996-01-01), None
patent: 8-43853 (1996-02-01), None
patent: 8-146462 (1996-06-01), None
patent: 9-120083 (1997-06-01), None
patent: 09-265113 (1997-10-01), None
patent: 2000-216395 (2000-08-01), None

Affiliated with

Also associated with

Rating

Active matrix substrate plate and manufacturing method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Active matrix substrate plate and manufacturing method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Active matrix substrate plate and manufacturing method therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3415747