Active-matrix substrate and method of fabricating same

Details Active-matrix substrate and method of fabricating same Active-matrix substrate and method of fabricating same

2007-05-29

2007-05-29

Estrada, Michelle (Department: 2823)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S151000, C438S149000, C257SE27112, C257SE29117, C257SE21703

Reexamination Certificate

active

10833153

ABSTRACT:
An active-matrix substrate is provided, which suppresses the unevenness of its surface due to the height difference of the TFTs and gate and data lines from the remaining area. After TFTS, gate lines, and data lines are formed on a transparent base, a transparent dielectric layer is formed on the base to cover the TFTs, the gate lines, and the data lines. The dielectric layer is selectively etched to form transparent dielectric portions arranged in a matrix array in such a way as to form a first plurality of recesses extending along the respective gate lines and a second plurality of recesses extending along the respective data lines. Each of the portions has a thickness equal to or greater than the maximum height of the TFTs, the gate lines, or the data lines, and a distance equal to or greater than the thickness thereof from a corresponding one of the TFTs, the gate lines, or the data lines. A planarization layer is then formed to fill at least the first plurality of recesses and the second plurality of recesses. Pixel electrodes are arranged on or over the flat surfaces of the respective portions. The connection part of each pixel electrode is connected to a corresponding one of the TFTs by way of a corresponding one of holes of the planarization layer.

REFERENCES:
patent: 5327268 (1994-07-01), Takabatake et al.
patent: 5561440 (1996-10-01), Kitajima et al.
patent: 5585951 (1996-12-01), Noda et al.
patent: 5831281 (1998-11-01), Kurogane et al.
patent: 5920084 (1999-07-01), Gu et al.
patent: 5981974 (1999-11-01), Makita
patent: 5990555 (1999-11-01), Ohori et al.
patent: 6081310 (2000-06-01), Katsuya et al.
patent: 6097452 (2000-08-01), Shimada et al.
patent: 6204905 (2001-03-01), Koma et al.
patent: 6259200 (2001-07-01), Morita et al.
patent: 6277679 (2001-08-01), Ohtani
patent: 6372558 (2002-04-01), Yamanaka et al.
patent: 6404474 (2002-06-01), Watanabe et al.
patent: 6426245 (2002-07-01), Kawasaki et al.
patent: 6480577 (2002-11-01), Izumi et al.
patent: 6501096 (2002-12-01), Hashimoto et al.
patent: 2001/0000755 (2001-05-01), Hirakata et al.
patent: 2001/0010572 (2001-08-01), Koma et al.
patent: H05-045638 (1993-02-01), None
patent: 6-67202 (1994-03-01), None
patent: H11-052419 (1999-02-01), None
patent: H11-072804 (1999-03-01), None
patent: H11-101992 (1999-04-01), None
patent: 11-218781 (1999-08-01), None
patent: H11-316382 (1999-11-01), None

Affiliated with

Also associated with

Rating

Active-matrix substrate and method of fabricating same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Active-matrix substrate and method of fabricating same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Active-matrix substrate and method of fabricating same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3720792