Active matrix structure for a display device and method for...

Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of...

Reexamination Certificate

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Details

C438S099000, C438S151000, C257SE29183

Reexamination Certificate

active

07605046

ABSTRACT:
The invention relates to an active matrix structure and method for manufacturing the active matrix structure for a display device, wherein the structure includes: providing a matrix substrate with a number of row lines and a number of column lines, with each point of intersection between one of the row lines and one of the column lines being assigned a passage through the matrix substrate for generating a pixel, depositing a layer of p-silicon on the matrix substrate, for each pixel, creating an n+-doped region in the p-silicon, which n+-doped region is provided from the passage as far as a free surface of the p-silicon layer, and creating a p+-doped region within the n+-doped region such that a layer of the n+-doped region remains, and applying a layer made of a matrix material which has particles of electronic ink contained therein, or an organic light-emitting diode layer on a free surface of the final structure resulting from step c).

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Kagan, C. R. and Andry, P.; “Thin-Film Transistors”; 2003; Marcel Dekker, Inc.; p. 188.

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