Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate
2010-05-07
2010-11-30
Prenty, Mark (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
C257S072000
Reexamination Certificate
active
07842954
ABSTRACT:
An active matrix array structure, disposed on a substrate, includes a first patterned conductive layer, a patterned gate insulating layer, a patterned semiconductor layer, a second patterned conductive layer, a patterned overcoat layer and a transparent conductive layer. The patterned gate insulating layer has first openings that expose a part of the first patterned conductive layer. The patterned semiconductor layer is disposed on the patterned gate insulating layer. The second patterned conductive layer is disposed on the patterned semiconductor layer. The patterned overcoat layer has second openings that expose a part of the first patterned conductive layer and a part of the second patterned conductive layer. The transparent conductive layer is completely disposed on the substrate. The transparent conductive layer disposed in the first openings and the second openings is broken off at a position that is in between the substrate and the patterned overcoat layer.
REFERENCES:
patent: 7754547 (2010-07-01), Yu et al.
Fang Kuo-Lung
Lin Han-Tu
Lin Hsiang-Lin
Tseng Hsien-Chieh
Yu Wei-Sheng
Au Optronics Corporation
Jianq Chyun IP Office
Prenty Mark
LandOfFree
Active matrix array structure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Active matrix array structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Active matrix array structure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4161177