Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Making emissive array
Reexamination Certificate
2010-07-14
2011-12-06
Sefer, Ahmed (Department: 2893)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Making emissive array
C257S059000, C257S072000, C257S088000, C257SE27110, C257SE29146, C257SE29151
Reexamination Certificate
active
08071407
ABSTRACT:
An active device array substrate and its fabricating method are provided. According to the subject invention, the elements of an array substrate such as the thin film transistors, gate lines, gate pads, data lines, data pads and storage electrodes, are provided by forming a patterned first metal layer, an insulating layer, a patterned semiconductor layer and a patterned metal multilayer. Furthermore, the subject invention uses the means of selectively etching certain layers. Using the aforesaid means, the array substrate of the subject invention has some layers with under-cut structures, and thus, the number of the time-consuming and complicated mask etching process involved in the production of an array substrate can be reduced. The subject invention provides a relatively simple and time-saving method for producing an array substrate.
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Taiwan Office Action issued Sep. 28, 2011.
Fang Kuo-Lung
Lin Han-Tu
Lin Hsiang-Lin
AU Optronics Corp.
Sefer Ahmed
Thomas Kayden Horstemeyer & Risley LLP
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