Activated vapor treatment for neutralizing warfare agents

Hazardous or toxic waste destruction or containment – Processes for making harmful chemical substances harmless,... – By subjecting to electric or wave energy or particle or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C588S301000, C588S302000

Reexamination Certificate

active

07102052

ABSTRACT:
Hydrogen peroxide is vaporized (20) and mixed (30) with ammonia gas in a ratio between 1:1 and 1:0.0001. The peroxide and ammonia vapor mixture are conveyed to a treatment area (10) to neutralize V-type, H-type, or G-type chemical agents, pathogens, biotoxins, spores, prions, and the like. The ammonia provides the primary deactivating agent for G-type agents with the peroxide acting as an accelerator. The peroxide acts as the primary agent for deactivating V-type and H-type agents, pathogens, biotoxins, spores, and prions. The ammonia acts as an accelerator in at least some of these peroxide deactivation reactions.

REFERENCES:
patent: 5430228 (1995-07-01), Ciambrone et al.
patent: 5714128 (1998-02-01), Ritter
patent: 6245957 (2001-06-01), Wagner et al.
patent: 19732594 (1999-02-01), None
patent: 1 166 825 (2002-01-01), None
patent: 2651133 (1991-03-01), None
patent: 2002066308 (2002-03-01), None
Wagner, et al., “Rapid Nucleophilic/Oxidative Decontamination of Chemical Warfare Agents”, Ind. Eng. Chem. Res. 2002, 41, 1925-1928, no month.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Activated vapor treatment for neutralizing warfare agents does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Activated vapor treatment for neutralizing warfare agents, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Activated vapor treatment for neutralizing warfare agents will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3590739

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.