Abrasive tool making process – material – or composition – Miscellaneous
Patent
1993-09-03
1995-01-17
Bell, Mark L.
Abrasive tool making process, material, or composition
Miscellaneous
51295, 51308, 51309, 106 3, B24D 1800
Patent
active
053822722
ABSTRACT:
Disclosed is a process for preparing activated compositions and the compositions derived therefrom which are suitable for polishing surfaces, particularly integrated circuits, wherein a base abrasive is activated by addition of a second cation whose oxide exhibits a higher polishing rate than the base abrasive alone. The activation is effected by chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium whose pH is at a level which is favorable for adsorption of the activating cation onto the base abrasive surface.
REFERENCES:
patent: 2892797 (1957-06-01), Alexander et al.
patent: 3262766 (1966-07-01), Nonamaker
patent: 3301646 (1967-01-01), Smoot
patent: 3768989 (1973-10-01), Goetzinger et al.
patent: 3922393 (1975-11-01), Sears, Jr.
patent: 4169337 (1979-10-01), Payne
patent: 4384038 (1983-05-01), Khoe et al.
patent: 4769046 (1988-09-01), Senda et al.
patent: 5228886 (1993-07-01), Zipperian
Silvernail and Goetzinger, "Mechanism of Glass Polishing" Glass Industry, vol. 52, 1971, pp. 172-175. No Month.
Shlishevskii and Migos'kina, "Acceleration of Glass Polishing Processes with Chemical Reagents," Sov. J. Opt. Tech., vol. 44, 1977, pp. 680-681. No Month.
Iler, The Chemistry of Silica, Wiley-Interscience, NYC, 1979, pp. 667-676. No Month.
Brancaleoni Gregory
Cook Lee M.
Loncki Scott B.
Bell Mark L.
Benson Kenneth A.
Jones Deborah
Rodel Inc.
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