Activated polishing compositions

Details Activated polishing compositions Activated polishing compositions

1994-09-06

1996-01-02

Jones, Deborah

Compositions: coating or plastic

Coating or plastic compositions

Polishes

51295, 51308, 51309, 437946, C09G 102

Patent

active

054804760

ABSTRACT:
Disclosed is a process for preparing activated compositions and the compositions derived therefrom which are suitable for polishing surfaces, particularly integrated circuits, wherein a base abrasive is activated by addition of a second cation whose oxide exhibits a higher polishing rate than the base abrasive alone. The activation is effected by chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium whose pH is at a level which is favorable for adsorption of the activating cation onto the base abrasive surface.

REFERENCES:
patent: 2892797 (1959-06-01), Alexander et al.
patent: 3262766 (1966-07-01), Nonamaker
patent: 3301646 (1967-01-01), Smoot
patent: 3768989 (1973-10-01), Goetzinger et al.
patent: 3922393 (1975-11-01), Sears, Jr.
patent: 4169337 (1979-10-01), Payne
patent: 4384038 (1983-05-01), Khoe et al.
patent: 4769046 (1988-09-01), Senda et al.
patent: 5228886 (1993-07-01), Zipperian
patent: 5382272 (1995-01-01), Cook et al.
Silvernail and Goetzinger, "Mechanism of Glass Polishing" Glass Industry, vol. 52, 1971, pp. 172-175.
Shlishevskii And Migoskina, "Acceleration of Glass Polishing Processing with Chemical Reagents," Sov. J. Opt. Tech., vol. 44, 1977, pp. 680-681.
Iler, The Chemistry of Silica, Wiley-Interscience, NYC, 1979, pp. 667-676.

Affiliated with

Also associated with

Rating

Activated polishing compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Activated polishing compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Activated polishing compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-232518