Actinic radiation emissive pattern defining masks for fine line

Radiant energy – Radiation controlling means

Patent

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Details

250492A, G21K 504

Patent

active

040888967

ABSTRACT:
An actinic radiation emissive mask for a high resolution lithography emits actinic radiation which originates within the mask. The mask patterns the actinic radiation to expose resist in accordance with a desired pattern. The actinic radiation originating in the mask may be produced by radioactivity, stimulated emission or combinations thereof.

REFERENCES:
patent: 3843916 (1974-10-01), Trotel et al.
patent: 4008402 (1977-02-01), O'Keeffe et al.

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