Acrylonitrile copolymers having low residual monomer content and

Details Acrylonitrile copolymers having low residual monomer content and Acrylonitrile copolymers having low residual monomer content and

1979-01-24

1980-12-23

Wong, Jr., Harry

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

128 68, 428220, 526 73, 526228, 5263232, 5263293, 526342, 528503, C08F22014, C08F22044

Patent

active

042412030

ABSTRACT:
What is disclosed are copolymers predominantly containing acrylonitrile and having a very low residual monomer content, for example of less than 100 ppm, the method of making such copolymers by polymerization to at least 60 percent conversion followed by post-heating at a temperature of more than 130.degree. C., and the use of such copolymers in orthopedic devices which come into direct contact with the skin.

REFERENCES:
patent: 2656334 (1953-10-01), D'Alelio
patent: 2974125 (1961-03-01), Lang et al.
patent: 3252950 (1966-05-01), Terenzi et al.
patent: 3847885 (1974-11-01), Peeso

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