Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1996-12-23
1999-01-12
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427346, 427600, B01J 1908
Patent
active
058584757
ABSTRACT:
A method is disclosed to improve the planarization of a coating upon a substrate, in particular to improve the planarization of a photoresist or spin-on-glass coating upon a semiconductor wafer. This is achieved by coupling an ultrasonic wave generator to either the chuck or the spindle of the chuck. Ultrasonic waves emanating from the ultrasonic generator are induced into the coating, vibrating it. The vibration causes coating material to fill in the valleys of the coating, thus planarizing the surface of the coating.
REFERENCES:
patent: 5472370 (1995-12-01), Malshe et al.
Ackerman Stephen B.
Pianalto Bernard
Saile George O.
Taiwan Semiconductor Manufacturing Company Ltd
LandOfFree
Acoustic wave enhanced spin coating method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acoustic wave enhanced spin coating method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acoustic wave enhanced spin coating method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1512648