Coating apparatus – With means to centrifuge work
Patent
1998-11-20
2000-02-01
Edwards, Laura
Coating apparatus
With means to centrifuge work
118 57, 118500, B05C 1300
Patent
active
060198443
ABSTRACT:
A method and an apparatus are disclosed to improve the planarization of a coating upon a substrate, in particular to improve the planarization of a photoresist or spin-on-glass coating upon a semiconductor wafer. This is achieved by coupling an ultrasonic wave generator to either the chuck or the spindle of the chuck. Ultrasonic waves emanating from the ultrasonic generator are induced into the coating, vibrating it. The vibration causes coating material to fill in the valleys of the coating, thus planarizing the surface of the coating.
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Ackerman Stephen B.
Edwards Laura
Saile George O.
Taiwan Semiconductor Manufacturing Company
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