Acoustic emission process and system for improved flaw source lo

Details Acoustic emission process and system for improved flaw source lo Acoustic emission process and system for improved flaw source lo

1975-02-28

1976-10-12

Ruehl, Charles A.

Measuring and testing

Moisture content or absorption characteristic of material

G01H 100

Patent

active

039850242

ABSTRACT:
An acoustic emission process and system for improved flaw source location employing spatial filtration. Masterslave discrimination, rise time discrimination, and/or coincidence detection are integrated into a multi-channel flaw source location system to reject unwanted signals. A computer provides calculation of the flaw source coordinates from the valid signals.

REFERENCES:
patent: 3858439 (1975-01-01), Nakamura
patent: 3919883 (1975-11-01), Nakamura et al.
Nakamura, "Acoustic Emission Monitoring System for Detection of Cracks in Complex Structure", Materials Evaluation, vol. 29, No. 1, Jan. 1971, pp. 8-12.

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