Acoustic deposition of material layers

Coating processes – Direct application of electrical – magnetic – wave – or...

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427461, 427565, 427600, B01J 1908

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active

055914900

ABSTRACT:
A method of depositing fluid using acoustic droplet ejectors onto a receptor until the desired layer is formed.

REFERENCES:
patent: 3198170 (1965-08-01), Onishi et al.
patent: 4290384 (1981-09-01), Ausschnitt et al.
patent: 4308547 (1981-12-01), Lovelady et al.
patent: 4697195 (1987-09-01), Quate et al.
patent: 4719476 (1988-01-01), Elrod et al.
patent: 4719480 (1988-01-01), Elrod et al.
patent: 4748461 (1988-05-01), Elrod
patent: 4751529 (1988-06-01), Elrod et al.
patent: 4751530 (1988-06-01), Elrod et al.
patent: 4751534 (1988-06-01), Elrod et al.
patent: 4797693 (1989-01-01), Quate
patent: 4845517 (1989-07-01), Temple et al.
patent: 4959674 (1990-09-01), Khri-Yakub et al.
patent: 5028937 (1991-07-01), Khuri-Yakub et al.
patent: 5040003 (1991-08-01), Willis
patent: 5041849 (1991-08-01), Quate et al.
patent: 5087931 (1992-02-01), Rawson
patent: 5111220 (1992-05-01), Hadimioglu et al.
patent: 5121141 (1992-06-01), Hadimioglu et al.
patent: 5122818 (1992-06-01), Elrod et al.
patent: 5142307 (1992-08-01), Elrod et al.
patent: 5216451 (1993-06-01), Rawson et al.
Elrod, S. A.; Hadimioglu, B.; Khuri-Yakub, B. T.; Rawson, E. G.; Richley, E.; Quate, C. F. Nozzleless Droplet Formation with Focused Acoustic Beams. J. Appl. Phys., vol. 65, No. 9, 1 May 1989. pp. 3441-3447.

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