Chemistry: electrical and wave energy – Processes and products
Patent
1977-12-15
1979-01-30
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
C25D 322
Patent
active
041371330
ABSTRACT:
This invention relates to a method of producing bright zinc electrodeposits over a wide current density range, which comprises passing current from a zinc anode to a metal cathode for a time period sufficient to deposit a bright zinc electrodeposit upon said cathode; the current passing through an aqueous acidic bath composition containing at least one zinc compound providing zinc cations for electroplating zinc such as zinc chloride, zinc fluoborate, zinc sulfamate and zinc sulfate; chloride, fluoborate, sulfamate and/or sulfate anions may be added as salts of bath compatible cations to provide better electrical conductivity, and containing as cooperating additives at least one bath soluble substituted or unsubstituted polyether, at least one aliphatic unsaturated acid containing an aromatic or heteroaromatic group and at least one aromatic or N-heteroaromatic aldehyde.
REFERENCES:
patent: RE27999 (1974-04-01), Korpiun et al.
patent: 3694330 (1972-09-01), Korpiun et al.
patent: 3729394 (1973-04-01), Hsu et al.
patent: 3730855 (1973-05-01), Poor et al.
patent: 3778359 (1973-12-01), Popescu
patent: 3821095 (1974-06-01), Harbulak
patent: 3855085 (1974-12-01), Rushmere
patent: 3878069 (1975-04-01), Todt et al.
patent: 3891520 (1975-06-01), Todt et al.
patent: 3919056 (1975-11-01), Harbulak
patent: 3928149 (1975-12-01), Steeg
patent: 4070256 (1978-01-01), Hsu et al.
Kaplan G. L.
M&T Chemicals Inc.
Spector Robert
Wheeless Kenneth G.
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