Acid-sensitive substance and photosensitive compositions therewi

Details Acid-sensitive substance and photosensitive compositions therewi Acid-sensitive substance and photosensitive compositions therewi

1997-07-21

1999-11-30

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

4302711, 430944, 4302701, 101457, 101463, 101453, 5253288, 5253295, 5253298, 5253297, 526309, 526314, G03F 7021, G03F 7039, G03F 709

Patent

active

059940239

ABSTRACT:
According to the present invention there is provided a polymer not comprising maleic acid derivatives having acid labile groups pendant from the polymer backbone, characterized in that said pendant groups are represented by

REFERENCES:
patent: 4837124 (1989-06-01), Wu et al.
patent: 5120633 (1992-06-01), Bauer et al.
patent: 5332650 (1994-07-01), Murata et al.
patent: 5340699 (1994-08-01), Haley et al.
patent: 5837420 (1998-11-01), Aoai et al.

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