Acid-resistant copolymer and photographic element incorporating

Details Acid-resistant copolymer and photographic element incorporating Acid-resistant copolymer and photographic element incorporating

1978-04-03

1979-05-01

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

96 351, 526 9, 20415922, 96115P, G03C 168

Patent

active

041521595

ABSTRACT:
A photocrosslinkable polymer and imaging element containing said polymer are described wherein acid resistance is achieved by vinyl ester recurring units. A process for etching an element so prepared features exposure, development, and etching in an acid bath.

REFERENCES:
patent: 1900009 (1972-07-01), Dunham et al.
patent: 2610120 (1952-09-01), Minsk et al.
patent: 2690966 (1954-10-01), Minsk et al.
patent: 2725372 (1955-11-01), Minsk et al.
patent: 3257664 (1966-06-01), Luebner et al.
patent: 3696072 (1972-10-01), Reynolds et al.
patent: 3821167 (1974-06-01), Asano

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