Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-03-08
1999-01-12
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, H03F 7023
Patent
active
058586059
ABSTRACT:
A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.
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patent: 5641604 (1997-06-01), Sinta et al.
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Pai Daniel Y.
Sinta Roger F.
Chu John S.
Corless Peter F.
Frickey Darryl P.
Goldberg Robert L.
Shipley Company L.L.C.
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