Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...
Patent
1997-09-03
1998-12-22
Lipman, Bernard
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Mixing of two or more solid polymers; mixing of solid...
430170, 430176, 4302701, 525385, 525386, C08F 814
Patent
active
058521283
ABSTRACT:
Acid-labile group protected hydroxystyrene polymers having recurrent pendant groups such as 1-(2-methanecarbonyl oxyethoxy)ethoxy group and 1-(2-N-methylcarbamatoethoxy) ethoxy group. A resist containing the polymer, a photo acid generator, a base, additives and a solvent is sensitive to UV, electron beam and X-ray. In the resist, acid is formed in the exposed area during irradiation, which deprotects acid-labile group catalytically during application of post-exposure baking. Positive patterns are formed after development using an alkaline solution.
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Funato Satoru
Kinoshita Yoshiaki
Masuda Seiya
Okazaki Hiroshi
Padmanaban Munirathna
Clariant AG
Lipman Bernard
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