Acid dip for zinc-manganese alloy electrodeposition

Details Acid dip for zinc-manganese alloy electrodeposition Acid dip for zinc-manganese alloy electrodeposition

2006-07-04

2006-07-04

Wong, Edna (Department: 1753)

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Depositing predominantly alloy coating

C205S238000, C106S001290

Reexamination Certificate

active

07070689

ABSTRACT:
The invention relates to a dip comprising an acid aqueous solution having no ammonium ion, fluoroborate ions or citrate ion and containing per liter: between 10 and 60 g of Zn2+ions and between 20 and 100 g of Mn2+ions. The invention is characterised in that it comprises a buffer agent that maintains the pH at a value of between 3 and 7, preferably between 4.5 and 6 or better still between 4.8 and 5.5, and another agent, different from the buffer agent, which is used to bring together the deposition potentials of couple Zn/Zn2+and couple Mn/Mn2+. The inventive dip used to deposit a Zn and Mn alloy by electrolysis.

REFERENCES:
patent: 4898652 (1990-02-01), Bammel et al.
patent: 6387229 (2002-05-01), Cornelius Verberne
patent: 2762331 (1998-10-01), None
patent: 2 351 503 (2001-01-01), None
patent: 57094590 (1982-06-01), None
patent: 03090591 (1991-04-01), None
patent: 5065674 (1993-03-01), None

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