Optical: systems and elements – Diffraction – From zone plate
Reexamination Certificate
2005-04-26
2005-04-26
Assaf, Fayez G. (Department: 2872)
Optical: systems and elements
Diffraction
From zone plate
C359S558000, C359S569000, C359S351000, C359S355000, C355S053000, C355S055000
Reexamination Certificate
active
06885503
ABSTRACT:
A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.
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Nill Kenneth W.
Wang Yuxin
Yun Wenbing
Assaf Fayez G.
O'Banion John P.
Xradia, Inc.
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