Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2008-03-25
2008-03-25
Webb, Gregory (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S421000, C510S506000
Reexamination Certificate
active
07348300
ABSTRACT:
Disclosed herein are process solutions, which may be aqueous-based, non-aqueous-based, and combinations thereof, that contain at least one alkoxylated acetylenic diol surfactant. In one aspect, the process solution comprises water and an alkoxylated acetylenic diol surfactant having the formula A:where r and t are 1 or 2, (n+m) is 1 to 30 and (p+q) is 1 to 30.
REFERENCES:
patent: 3268593 (1966-08-01), Carpenter et al.
patent: 4117249 (1978-09-01), De Simone et al.
patent: 4214924 (1980-07-01), Piucci
patent: 4241224 (1980-12-01), Newkirk et al.
patent: 4374920 (1983-02-01), Wanat et al.
patent: 4668423 (1987-05-01), Drozd et al.
patent: 4786578 (1988-11-01), Neisius et al.
patent: 4814514 (1989-03-01), Yokota et al.
patent: 4833067 (1989-05-01), Shingo et al.
patent: 4885064 (1989-12-01), Bokisa et al.
patent: 5098478 (1992-03-01), Krishnan et al.
patent: 5127571 (1992-07-01), Gutierrez et al.
patent: 5466389 (1995-11-01), Ilardi et al.
patent: 5562762 (1996-10-01), Mrvos et al.
patent: 5650543 (1997-07-01), Medina
patent: 5756267 (1998-05-01), Kassanao et al.
patent: 5948464 (1999-09-01), Delnick
patent: 5977041 (1999-11-01), Honda
patent: 6152148 (2000-11-01), George et al.
patent: 6261745 (2001-07-01), Tanabe et al.
patent: 6284718 (2001-09-01), Simon
patent: 6310019 (2001-10-01), Kakizawa et al.
patent: 6313182 (2001-11-01), Lassila et al.
patent: 6455234 (2002-09-01), Lassila et al.
patent: 6465403 (2002-10-01), Skee
patent: 6514330 (2003-02-01), Kanaya et al.
patent: 6585825 (2003-07-01), Skee
patent: 6641986 (2003-11-01), Zhang et al.
patent: 6670107 (2003-12-01), Lachowski
patent: 6864395 (2005-03-01), Lassila et al.
patent: 2001/0021489 (2001-09-01), Wakiya et al.
patent: 2002/0016272 (2002-02-01), Masahiko et al.
patent: 2002/0055660 (2002-05-01), Lassila et al.
patent: 2002/0077259 (2002-06-01), Skee
patent: 2002/0106589 (2002-08-01), Rodney et al.
patent: 2002/0115022 (2002-08-01), Messick et al.
patent: 2002/0121287 (2002-09-01), Gilton
patent: 2003/0228762 (2003-12-01), Moeggenborg et al.
patent: 2003/0228763 (2003-12-01), Schroeder et al.
patent: 2004/0029395 (2004-02-01), Zhang et al.
patent: 2004/0029396 (2004-02-01), Zhang et al.
patent: 2004/0053172 (2004-03-01), Zhang et al.
patent: 2004/0053800 (2004-03-01), Zhang et al.
patent: 2004/0149309 (2004-08-01), Hsu
patent: 0178495 (1990-03-01), None
patent: 0231028 (1991-08-01), None
patent: 1065708 (2001-01-01), None
patent: 1 115 035 (2001-07-01), None
patent: 1 389 745 (2004-02-01), None
patent: 3063187 (1991-03-01), None
patent: 4071894 (1992-03-01), None
patent: 4091168 (1992-03-01), None
patent: 6279081 (1994-10-01), None
patent: 95142349 (1995-06-01), None
patent: 96008163 (1996-01-01), None
patent: 1996183663 (1996-07-01), None
patent: 2621662 (1997-06-01), None
patent: 9150577 (1997-06-01), None
patent: 2569377 (1997-08-01), None
patent: 2636954 (1997-08-01), None
patent: 10114880 (1998-05-01), None
patent: 1999080639 (1999-03-01), None
patent: 1999256087 (1999-09-01), None
patent: 11352703 (1999-12-01), None
patent: 2002020787 (2002-01-01), None
patent: 2002148821 (2002-05-01), None
patent: 2004184648 (2004-07-01), None
patent: WO 8703387 (1987-06-01), None
patent: WO 9915609 (1999-04-01), None
patent: WO 9960083 (1999-11-01), None
patent: WO 9960448 (1999-11-01), None
patent: WO 0003306 (2000-01-01), None
patent: WO 00/14785 (2000-03-01), None
patent: WO 00/18523 (2000-04-01), None
patent: WO 0223598 (2002-03-01), None
patent: WO 2004/051379 (2004-06-01), None
Domke, W. D., et al., “Pattern Collapse in High Aspect Ratio DUV and 293nm Resists”, Proc. SPIE-Int. Soc. Opt. Eng. 3999, 313-321, 2000.
Cheung, C., et al. “A Study of a single Closed Contact for 0.18 Micron Photolithography Process,” Proc. SPIE-Int. Soc. Opt. Eng. 3998, 738-741, 2000.
S. Hein, et al., “Collapse behavior of single layer 293 and 157 nm resists: Use of surfactants in the rinse to realize the sub 130 nm nodes”, Infineon Technologies, International SEMATECH, Center for Nano Technology, University of Wisconsin, (2002).
T. Tanaka, et al., “Mechanism of Resist Pattern Collapse During Development Process”, Jpn. J. Appl. Phys. vol. 32 (1993), pp. 6059-6064, Part 1, No. 12B.
P. Zhang, et al., “Surface Conditioning Solutions to Reduce Resist Line Roughness”, Air Products and Chemicals, Inc., SPIE International symposium Microlithography, Feb. 22-27, 2004, Santa Clara, CA.
Schwartz, J., “The Importance of low Dynamic Surface Tension in Waterborne Coatings”, Journal of Coatings Technology, Sep. 1992.
Wirth, W.; Storp, S., Jacobsen, W., “Mechanisms Controlling Leaf Retention of Agricultural Spray Solutions”, Pestic. Sci. 1991, 33, 411-420.
Medina, S. W., Sutovich, M. N., “Using Surfactants to Formulate VOC Compliant Waterbased Inks”, Am. Ink Maker 1994, 72 (2) 32-38.
Leeds, et al., I&EC Product Research and Development 1965, 4, 237.
Barber Leslie Cox
Curzi Danielle Megan King
Lassila Kevin Rodney
Ross Brenda Faye
Uhrin Paula Ann
Air Products and Chemicals Inc.
Rossi Joseph D.
Webb Gregory
LandOfFree
Acetylenic diol ethylene oxide/propylene oxide adducts and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acetylenic diol ethylene oxide/propylene oxide adducts and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acetylenic diol ethylene oxide/propylene oxide adducts and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2802474