Accurate positioning of a wafer

Details Accurate positioning of a wafer Accurate positioning of a wafer

1999-02-09

2000-10-17

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With alarm, signal, indicating, testing, inspecting,...

134144, 134151, 134902, 414936, B08B 302

Patent

active

061315893

ABSTRACT:
A load station is used in a planarizing machine to perform several useful functions related to handling of a wafer. By centering the wafer with respect to a spindle carrier the load station interrupts the accumulation of positional errors. The load station never makes solid contact with the wafer, but instead the wafer is continually levitated on three cushions of water that are directed upwardly against the lower face of the wafer. The presence of the wafer partially impedes the flow of water from the nozzles used for levitation causing an increase in the water pressure immediately upstream of the nozzles. This increased pressure is sensed and used as an indicator of the presence of a wafer at the load station. The load station further includes a nozzle that directs a stream against the lower side of the wafer so as to elevate the wafer from the load station into the carrier.

REFERENCES:
patent: 4747928 (1988-05-01), Satoh et al.
patent: 5169408 (1992-12-01), Satoh et al.
patent: 5421056 (1995-06-01), Tateyama et al.
patent: 5591262 (1997-01-01), Sago et al.
patent: 5934984 (1999-08-01), Togawa et al.
patent: 5954072 (1999-09-01), Matusita
patent: 5979475 (1999-11-01), Satoh et al.

Affiliated with

Also associated with

Rating

Accurate positioning of a wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Accurate positioning of a wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Accurate positioning of a wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-459109