Accurate placement and retention of an amalgam in a electrodeles

Details Accurate placement and retention of an amalgam in a electrodeles Accurate placement and retention of an amalgam in a electrodeles

1995-05-23

1997-05-13

Horabik, Michael

Electric lamp and discharge devices

Having vapor generating material

Mercury vapor material

313490, H01J 1726

Patent

active

056295847

ABSTRACT:
An amalgam is accurately placed and retained in an optimized location in the exhaust tube of an electrodeless SEF lamp for operation at a mercury vapor pressure in the optimum range from approximately four to seven millitorr by forming a dimple in the exhaust tube and using a dose locating member to locate and retain the amalgam on the side of the dimple away from the core of the lamp after filling the lamp. As an alternative, two dimples may be situated on opposite sides of the exhaust tube for performing the same function as, but with less depth than, the single dimple. In another alternative embodiment, first and second dimple configurations are formed in the exhaust tube after tip-off thereof, each dimple configuration including either one or two dimples. The second dimple configuration is spaced apart from the first dimple configuration along the length of the exhaust tube. In this way, the amalgam may be initially positioned farther from the tip-off region, thereby avoiding problems during tipping off of the exhaust tube, such as loss of mercury from the lamp, or quenching of the tip which could cause stress cracks. After tip-off, the second dimple configuration allows for placement of the amalgam closer to, or preferably in contact with, the tip of the sealed exhaust tube, i.e., the coolest location in the exhaust tube.

REFERENCES:
patent: 4010400 (1977-03-01), Hollister
patent: 4105910 (1978-08-01), Evans
patent: 4262231 (1981-04-01), Anderson et al.
patent: 4437041 (1984-03-01), Roberts
patent: 4499400 (1985-02-01), Anderson et al.
patent: 4622495 (1986-11-01), Smeelen
patent: 5200672 (1993-04-01), Sheynberg
patent: 5274305 (1993-12-01), Bouchard
Patent abstracts of Japan; vol. 10, No. 221 (E-424)(2277) 2 Aug. 1986 & JP-A-61 058 154 (Toshiba Corp.) 25 Mar. 1986.
Patent abstracts of Japan; vol. 13, No. 356 (E-803)(3704) 9 Aug. 1989 & JP-A-01 117 265 (Toshiba Corp.) 10 May 1989.
Patent abstracts of Japan; vol. 2, No. 47 (M-14) 29 Mar. 1978 & JP-A-53 004 378 (Tokyo Shibaura Denki K.K.) 14 Jan. 1978.
Patent abstracts of Japan; vol. 3, No. 137 (M-80) 14 Nov. 1979 & JP-A-54 112 580 (Nippon Denki K.K.) 3 Sep. 1979.
Patent abstracts of Japan; vol. 10, No. 54 (E-385)(2111) 4 Mar. 1986 & JP-A-60 208 023 (Toshiba K.K.) 19 Oct. 1985.

Affiliated with

Also associated with

Rating

Accurate placement and retention of an amalgam in a electrodeles does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Accurate placement and retention of an amalgam in a electrodeles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Accurate placement and retention of an amalgam in a electrodeles will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1387686