Absorbent solution for use with absorption refrigeration apparat

Details Absorbent solution for use with absorption refrigeration apparat Absorbent solution for use with absorption refrigeration apparat

1990-10-30

1992-04-28

Makay, Albert J.

Compositions

Vaporization, or expansion, refrigeration or heat or energy...

With low-volatile solvent or absorbent

62112, 62476, 252 67, C09K 500

Patent

active

051086387

ABSTRACT:
An absorbent solution for an absorption refrigeration apparatus is composed of water as a refrigerant and an absorbent. The absorbent is a mixture of at least three lithium compounds selected from the group consisting of lithium bromide, lithium iodide, lithium chloride, and lithium nitrate. The mixture ratio of, for example, lithium bromide to lithium iodide to lithium chloride in the absorbent is 1:0.1-1.0:0.05-0.50. Therefore, since absorption temperature sufficiently higher than crystallization temperature can be achieved, neither lithium halide nor lithium nitrate is precipitated in the absorbent solution during the operation cycle of the refrigeration apparatus.

REFERENCES:
patent: 3296814 (1967-01-01), Lynch et al.
patent: 3478530 (1969-11-01), Aronson
patent: 3524815 (1970-08-01), Hensel, Jr. et al.
patent: 3541013 (1970-11-01), Macriss et al.
patent: 3626708 (1971-12-01), Lyon
patent: 3643455 (1972-02-01), Hensel, Jr. et al.
patent: 4311024 (1982-01-01), Itoh et al.
patent: 4454724 (1984-06-01), Erickson
Hainsworth, "Refrigerants & Absorbents", Refrigerating Engineering, vol. 48, Sep. 1944, pp. 19 & 20.

Affiliated with

Also associated with

Rating

Absorbent solution for use with absorption refrigeration apparat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Absorbent solution for use with absorption refrigeration apparat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Absorbent solution for use with absorption refrigeration apparat will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1246778