Chemistry: electrical and wave energy – Processes and products
Patent
1981-04-27
1983-08-02
Tung, T.
Chemistry: electrical and wave energy
Processes and products
204406, G01N 2746
Patent
active
043964664
ABSTRACT:
This specification discloses an absolute pressure sensor and measuring technique using an electrochemical apparatus as a feedback element in an oscillator circuit. The sensor needs no reference pressure or reference vacuum. Contributing to sustained oscillation is a phase shift caused by the electrochemical apparatus. The period of oscillation of the oscillator circuit is inversely proportional to the diffusion coefficient of oxygen in its carrier gas, which, in turn, is inversely proportional to total absolute pressure. The result is that the period of oscillation of the oscillator circuit is proportional to total absolute pressure.
REFERENCES:
patent: 2999379 (1961-09-01), Beard et al.
patent: 3100868 (1963-08-01), McAfee
patent: 3311454 (1967-03-01), Kemeny et al.
patent: 3347635 (1967-10-01), McKee
patent: 3654112 (1972-04-01), Beekmans et al.
patent: 3698384 (1972-10-01), Jones
patent: 3857771 (1974-12-01), Sternberg
patent: 3907657 (1975-09-01), Heijne
patent: 3923624 (1975-12-01), Beekmans et al.
patent: 4101403 (1978-07-01), Kita et al.
patent: 4112893 (1978-09-01), Anzai
patent: 4121548 (1978-10-01), Hattori et al.
patent: 4135381 (1979-01-01), Sherwin
patent: 4147513 (1979-04-01), Bienkowski et al.
patent: 4148211 (1979-04-01), Sawa et al.
patent: 4272329 (1981-06-01), Hetrick et al.
patent: 4272330 (1981-06-01), Hetrick
patent: 4272331 (1981-06-01), Hetrick
Fate William A.
Hetrick Robert E.
Abolins Peter
Ford Motor Company
Sadler Clifford L.
Tung T.
LandOfFree
Absolute pressure sensor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Absolute pressure sensor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Absolute pressure sensor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-482717