Absolute position measurement apparatus

Details Absolute position measurement apparatus Absolute position measurement apparatus

2006-07-25

2009-06-30

Connolly, Patrick J (Department: 2877)

Optics: measuring and testing

By light interference

Having polarization

C356S497000

Reexamination Certificate

active

07554671

ABSTRACT:
A first beam having high coherence and a second beam having low coherence and having a central wavelength difference from that of the first beam are multiplexed onto the same optical axis. First and second multiplexed beams obtained by beam splitting are emitted at a measurement reflection plane and a reference plane, respectively. The reflected first and second multiplexed beams are multiplexed and interfere with each other. The interference generates a first interference signal that is obtained from the first beams at the interference unit and that relates to information on the distance to the measurement reflection plane and a second interference signal that is obtained from the second beams. The first and second interference signals are used to carry out calculations for determining the position of a measurement origin for the measurement reflection plane.

REFERENCES:
patent: 6618218 (2003-09-01), Kadowaki
patent: 2003/0081222 (2003-05-01), Kato
patent: 2007/0024862 (2007-02-01), Kadowaki et al.
patent: 2007/0195330 (2007-08-01), Ohashi et al.
Akio Hirai, Hirokazu Matsumoto: “High-sensitivity surface-profile measurements by heterodyne white-light interferometer” Optical Engineering, vol. 40, No. 3, Mar. 2001, pp. 387-391, XP002406320 *figure 3* *pp. 388-p. 389*.

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