Abrasives for copper CMP and methods for making

Details Abrasives for copper CMP and methods for making Abrasives for copper CMP and methods for making

2004-12-14

2008-11-25

Alanko, Anita K (Department: 1792)

Etching a substrate: processes

Nongaseous phase etching of substrate

Using film of etchant between a stationary surface and a...

C216S089000, C438S692000, C438S693000

Reexamination Certificate

active

07455791

ABSTRACT:
An aqueous chemical mechanical polishing slurry is provided that comprises precipitated amorphous silica abrasive particles treated with acidic aluminum. Also provided is a method of polishing an electronic component substrate comprising the steps of: a) obtaining an electronic component substrate, the electronic component substrate having an insulating film deposited over it, an interconnection pattern formed in the insulating film, and interconnection material deposited on the insulated film and in the interconnection pattern; and b) polishing the interconnection material until a surface of said insulating film is exposed by using an aqueous chemical mechanical polishing slurry comprising: precipitated amorphous silica abrasive particles treated with acidic aluminum.

REFERENCES:
patent: 4040858 (1977-08-01), Wason
patent: 5626715 (1997-05-01), Rostoker
patent: 6527818 (2003-03-01), Hattori et al.
patent: 6855635 (2005-02-01), Schumacher et al.
patent: 2005/0194358 (2005-09-01), Chelle

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