Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
Reexamination Certificate
2004-11-24
2011-10-18
Alanko, Anita (Department: 1713)
Etching a substrate: processes
Nongaseous phase etching of substrate
Using film of etchant between a stationary surface and a...
C438S692000, C438S633000, C438S645000, C438S687000
Reexamination Certificate
active
08038898
ABSTRACT:
An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
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Honma Yoshio
Hoshino Tetsuya
Kamigata Yasuo
Kondoh Seiichi
Matsuzawa Jun
Alanko Anita
Antonelli, Terry Stout & Kraus, LLP.
Hitachi , Ltd.
Hitachi Chemical Company Ltd.
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