Abrasive liquid for metal and method for polishing

Details Abrasive liquid for metal and method for polishing Abrasive liquid for metal and method for polishing

2005-05-31

2005-05-31

Norton, Nadine G. (Department: 1765)

Compositions

Etching or brightening compositions

C252S079400, C438S692000

Reexamination Certificate

active

06899821

ABSTRACT:
An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent informing a protecting film and (5) water; and a method for polishing.

REFERENCES:
patent: 4051057 (1977-09-01), Ericson et al.
patent: 4537654 (1985-08-01), Berenz et al.
patent: 4954142 (1990-09-01), Carr et al.
patent: 4968381 (1990-11-01), Prigge et al.
patent: 5084071 (1992-01-01), Nenadic et al.
patent: 5434107 (1995-07-01), Paranjpe
patent: 5575885 (1996-11-01), Hirabayashi et al.
patent: 5607718 (1997-03-01), Sasaki et al.
patent: 5691219 (1997-11-01), Kawakubo et al.
patent: 5733819 (1998-03-01), Kodama et al.
patent: 5770095 (1998-06-01), Sasaki et al.
patent: 5770103 (1998-06-01), Wang et al.
patent: 5876490 (1999-03-01), Ronay
patent: 5932486 (1999-08-01), Cook et al.
patent: 5954997 (1999-09-01), Kaufman et al.
patent: 5981394 (1999-11-01), Ohashi et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6206756 (2001-03-01), Chopra et al.
patent: 6313039 (2001-11-01), Small et al.
patent: 0 845 512 (1998-06-01), None
patent: 0 846 742 (1998-06-01), None
patent: 2-278822 (1990-11-01), None
patent: 6-88258 (1994-03-01), None
patent: 7-233485 (1995-09-01), None
patent: 08-083780 (1996-03-01), None
patent: 9-55363 (1997-02-01), None
patent: 09184081 (1997-07-01), None
patent: 10-163141 (1998-06-01), None
patent: 2000-501771 (2000-05-01), None
patent: 2001-0053167 (2001-06-01), None
patent: WO 98/26025 (1998-06-01), None
patent: WO 00/00561 (2000-01-01), None
Y. Hayashi et al., “A New Abrasive-Free, Chemical-Mechanical-Polishing for Aluminum Metallization of ULSI Devices”, International Electron Devices Meeting Technical Digest, 1992, pp. 976-978.
Luo et al., Chemical-Mechanical Polishing of Copper in Acidic Media, Feb. 22-23, 1996, 1996 CMP-MIC Conference 1996 ISMIC —100P/96/0145, pp. 145-151.
Office Action dated Jun. 10, 2004, for corresponding Canadian Application No. 2,342,332.
Written Opinion from the Australian Patent Office for Application No. SG 200200664-1, mailed Aug. 23, 2004.

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