Abrasive liquid for metal and method for polishing

Compositions – Etching or brightening compositions

Reexamination Certificate

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C252S079400, C438S692000

Reexamination Certificate

active

06896825

ABSTRACT:
An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

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Hayashi, Y. et al., A New Abrasive-Free, Chemical-Mechanical-Polishing for Aluminium Metallization of ULSI Devices, International Electron Devices Meeting Technical Digest, 1992, pp. 976-978.*
Luo et al., Chemical-Mechanical Polishing of Copper in Acidic Media, Feb. 22-23, 1996, 1996 CMP-MIC Conference 1996 ISMIC—100P/96/0145, pp. 145-151.*
Written Opinion from the Australian Patent Office for Application No. SG 200200664-1, mailed Aug. 23, 2004.

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