Abrasive composition for disc substrate, and process for polishi

Details Abrasive composition for disc substrate, and process for polishi Abrasive composition for disc substrate, and process for polishi

1997-08-27

2000-11-28

Marcheschi, Michael

Abrasive tool making process, material, or composition

With inorganic material

Metal or metal oxide

106 3, 510167, 510397, 451 36, C09K 314, C09G 102, C09G 104, B24B 100

Patent

active

061529761

ABSTRACT:
An abrasive composition for polishing a substrate for a magnetic recording disc is described, which comprises finely divided titanium oxide particles, an abrasion promoter, an optional water-soluble oxidizing agent, and water. This abrasive composition is used for polishing a substrate for a magnetic recording disc by a process wherein the substrate is polished with a pad while the abrasive composition is supplied between the substrate and the pad, and at least one of the pad and the substrate is rotated. The contents of the finely divided titanium oxide particles, the abrasion promoter and the optional water-soluble oxidizing agent are 2-20 wt. %, 1-20 wt. % and up to 10 wt. %, respectively, based on the weight of the abrasive composition as used for polishing the substrate.

REFERENCES:
patent: 3429080 (1969-02-01), Lachapelle
patent: 4959113 (1990-09-01), Roberts
patent: 5697992 (1997-12-01), Ueda et al.
patent: 5861054 (1999-01-01), Miyashita et al.

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