Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2006-06-28
2010-11-23
Shechtman, Sean P (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S108000, C700S164000, C700S173000, C700S175000, C438S005000, C451S001000, C451S443000
Reexamination Certificate
active
07840305
ABSTRACT:
The disclosure relates to abrasive articles useful in chemical-mechanical polishing (CMP), the articles including a substrate with opposite major surfaces, an abrasive material overlaying at least a portion of at least one of the major surfaces, and at least one of a radio frequency identification (RFID) tag, a RFID tag reader, or a sensor for providing CMP information to a transmitter positioned near the substrate, the transmitter positioned near the substrate and adapted to wirelessly receive CMP information and wirelessly transmit the CMP information to a remote receiver. The disclosure also relates to a CMP pad conditioner for wirelessly communicating CMP information to a remote receiver, a CMP process monitoring system for wirelessly communicating CMP information to a remote receiver, and a method for conditioning a CMP pad using a CMP process monitoring system for wireless communicating CMP information to a remote receiver.
REFERENCES:
patent: 4311489 (1982-01-01), Kressner
patent: 4652275 (1987-03-01), Bloecher et al.
patent: 4799939 (1989-01-01), Bloecher et al.
patent: 5343146 (1994-08-01), Koch et al.
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5550547 (1996-08-01), Chan et al.
patent: 5620489 (1997-04-01), Tselesin
patent: 5682143 (1997-10-01), Brady et al.
patent: 5692950 (1997-12-01), Rutherford et al.
patent: 5833519 (1998-11-01), Moore
patent: 5975994 (1999-11-01), Sandhu et al.
patent: 6123607 (2000-09-01), Ravkin et al.
patent: 6123612 (2000-09-01), Goers
patent: 6257953 (2001-07-01), Gitis et al.
patent: 6264533 (2001-07-01), Kummeth et al.
patent: 6319108 (2001-11-01), Adefris et al.
patent: 6330971 (2001-12-01), Mabry et al.
patent: 6352466 (2002-03-01), Moore
patent: 6387289 (2002-05-01), Wright
patent: 6407669 (2002-06-01), Brown et al.
patent: 6494765 (2002-12-01), Gitis et al.
patent: 6602724 (2003-08-01), Redeker et al.
patent: 6642853 (2003-11-01), Hunter
patent: 6722948 (2004-04-01), Berman
patent: 6752693 (2004-06-01), Kistler
patent: 7026941 (2006-04-01), Anderson
patent: 7044373 (2006-05-01), Garber et al.
patent: 7152011 (2006-12-01), Benjamin et al.
patent: 2003/0027424 (2003-02-01), Paik
patent: 2004/0113790 (2004-06-01), Hamel et al.
patent: 2005/0197044 (2005-09-01), Bolz
patent: 2006/0014475 (2006-01-01), Sekiya
patent: 1250372 (2006-04-01), None
patent: 2004-538169 (2004-12-01), None
patent: 2005-170065 (2005-06-01), None
patent: WO 02/26445 (2002-04-01), None
Behr Andrew H.
Goers Brian D.
Laraia Vincent J.
Palmgren Gary M.
Pendergrass, Jr. Daniel B.
3M Innovative Properties Company
Baker James A.
Kulprathipanja Ann
Shechtman Sean P
LandOfFree
Abrasive articles, CMP monitoring system and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Abrasive articles, CMP monitoring system and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Abrasive articles, CMP monitoring system and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4229237