Ablatively photodecomposable compositions

Details Ablatively photodecomposable compositions Ablatively photodecomposable compositions

1995-06-07

1998-01-06

Yoon, Tae

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

5253301, 5253305, 526266, 4302701, 430281, 430910, C08F22002, C08F22600, G03F 7039

Patent

active

057055700

ABSTRACT:
The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

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