Ablatively photodecomposable compositions

Details Ablatively photodecomposable compositions Ablatively photodecomposable compositions

1996-04-09

1997-09-30

Raymond, Richard L.

Organic compounds -- part of the class 532-570 series

Organic compounds

Amino nitrogen containing

556410, 564412, 564441, 564433, C07C31732

Patent

active

056727607

ABSTRACT:
The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

REFERENCES:
patent: Re28789 (1976-04-01), Chang
patent: 3867318 (1975-02-01), Nishikubo et al.
patent: 3985566 (1976-10-01), Buhr et al.
patent: 4720470 (1988-01-01), Johnson
patent: 4839261 (1989-06-01), Nakazaki et al.
patent: 4861425 (1989-08-01), Greer et al.
patent: 4877853 (1989-10-01), Siol et al.
patent: 4902610 (1990-02-01), Shipley
patent: 4913836 (1990-04-01), East
patent: 4957655 (1990-09-01), Khanarian et al.
patent: 4975223 (1990-12-01), Doi et al.
patent: 4978476 (1990-12-01), Allen et al.
patent: 5002361 (1991-03-01), DeMartino et al.
patent: 5017502 (1991-05-01), Sakama et al.
patent: 5041509 (1991-08-01), Lee et al.
patent: 5043251 (1991-08-01), Sonnenschein et al.
patent: 5130227 (1992-07-01), Wade et al.
patent: 5133898 (1992-07-01), Fock et al.
patent: 5137618 (1992-08-01), Burnett et al.
patent: 5153103 (1992-10-01), Kotachi et al.
patent: 5178961 (1993-01-01), Faust et al.
patent: 5178963 (1993-01-01), Faust et al.
patent: 5186865 (1993-02-01), Wu et al.
patent: 5196376 (1993-03-01), Reche
patent: 5207952 (1993-05-01), Griffin, III
patent: 5231140 (1993-07-01), Kilburg et al.
patent: 5246817 (1993-09-01), Shipley et al.
patent: 5262244 (1993-11-01), Faust et al.
patent: 5384221 (1995-01-01), Savant et al.
patent: 5401618 (1995-03-01), Chapman et al.
patent: 5460921 (1995-10-01), Cywar et al.
Swalen et al., Chemical Abstracts, vol. 118, abstract 243979 1993.

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