Aberration measuring method and projection exposure apparatus

Details Aberration measuring method and projection exposure apparatus Aberration measuring method and projection exposure apparatus

2005-11-01

2005-11-01

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S311000, C355S052000, C355S053000, C355S067000, C355S077000, C356S124000

Reexamination Certificate

active

06960415

ABSTRACT:
A method of measuring aberration of a projection optical system. The method includes the steps of imaging a test pattern through the projection optical system, and measuring a potential deviation amount of the image of the test pattern and measuring aberration of the project optical system on the basis of the positional deviation amount. The measuring step includes a process of determining a coefficient of a particular Zernike term and a process of changing a position or a shape of a region on a pupil plane of the projection optical system before light from the test pattern passes therethrough, in accordance with the particular Zernike term.

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