Aberration estimation reticle for determining overlay error

Details Aberration estimation reticle for determining overlay error Aberration estimation reticle for determining overlay error

1997-01-08

1999-08-17

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, G03F 900

Patent

active

059392266

ABSTRACT:
An aberration estimation reticle is provided with a plurality of units spaced from each other. The unit is provided with a first determination mark having a square planar configuration, and a second determination mark located in the first determination mark and including a plurality of holes arranged along a square. These structures provide an overlay error determination reticle and a method of determining an overlay error with the reticle taking an influence by aberration into consideration.

REFERENCES:
Min, Young-Hong, et al: "Effective Alignment Techniques and its Implementation to Enhance Total Overlay Accuracy on Highly Reflective Films", SPIE, vol. 2439, pp. 287-297.
Katagiri, Souichi, et al: "Overlay Error Estimation of Wafer Rear Surface Alignment for 0.1-pm Lithography", Jpn. J. Appl. Phys., vol. 32, pp. 6039-6043.
Lee, C.S., et al: "Overlay and Lens Distortion in a Modified Illumination Stepper", SPIE, vol. 2197, pp. 2-8.
Farrar, Nigel R.: "Effect of Off-Axis Illumination on Stepper Overlay", SPIE, vol. 2439, pp. 273-280.
Yan, Pei-yang, et al: "Effect of Lens Aberration on Oblique Illumination Stepper System", SPIE vol. 1927, Optical/Laser Microlithography VI(1993), pp. 167-180.

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